• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
  • 法律状态
  • 优先权
    • 专利摘要:
    The invention relates to a sensor device comprising a planar substrate defining a substrate plane and a waveguide for guiding an electromagnetic wave. The waveguide extends in a length direction in a waveguide plane parallel to the substrate plane and has a width and a height wherein the width to height ratio is more than 5. The height of the waveguide is less than the wavelength of the electromagnetic wave. The waveguide is supported on the substrate by a support structure extending from the substrate to the waveguide, along the length direction of the waveguide, having a width which is smaller than the width of the waveguide. The invention further relates to a method of detecting a component in gas and a method of fabricating a sensor device.(Fig. 1)
    公开号:SE1550898A1
    申请号:SE1550898
    申请日:2015-06-29
    公开日:2016-12-30
    发明作者:B Gylfason Kristinn；SOHLSTRÖM Hans；OTTONELLO BRIANO Floria；Stemme Göran
    申请人:B Gylfason Kristinn；Ottonello Briano Floria；Sohlstroem Hans；Stemme Goeran；
    IPC主号:
    专利说明:

    [1] [0001]electromagnetic wave, and to a method of detecting a component in a fluid such as gas.
    [2] [0002]infrared (IR) wavelength range is an established method. The absorption may be measured Optical sensing using the absorption bands of various gases in the visible or in cavities with mirrors, so that to achieve an effective interaction length which is longer thatthe physical size of the cavity. This approach is limited by the optical losses in the mirrors.For IR, the source is often a broadband incandescent lamp. To get a spectral resolution,optical spectral analysis is then needed. Detectors can be thermal or semiconductor based photon detectors.
    [3] [0003]mirrors must be used or the physical path, and hence the device size, must be long. For To make sensitive devices with a long optical path-length, either high quality many applications, low gas flows and the large volume of the gas chamber limit the response speed of the sensor.SUMMARY OF INVENTION
    [4] [0004]ln particular it is an object to provide a sensor device which may be small while maintaining a lt is an object of the present invention to reduce the shortcomings with prior art. sufficient sensitivity to detect components in gas.
    [5] [0005] a planar substrate defining a substrate plane Thus the present invention relates to a sensor device comprising; a waveguide for guiding an electromagnetic wave, the waveguide extending in a lengthdirection in a waveguide plane parallel to the substrate plane, the waveguide having a widthin the waveguide plane in a direction perpendicular to the length direction, and a height out ofthe waveguide plane in a direction perpendicular to the length direction, wherein the width toheight ratio is more than 5, wherein the height of the waveguide is less than the wavelength of the electromagneticwave, and wherein the waveguide is supported on the substrate by a support structure extending from the substrate to the waveguide, along the length direction of the waveguide, having a width which is smaller than the width of the waveguide, at the point of support of the waveguide.
    [6] [0006] maintaining a good sensitivity to detect components in gas. The features of the waveguide Thereby a sensor device is provided which may be miniaturized while provides for guiding an electromagnetic wave, having an evanescent wave propagatingalong the waveguide. The device may be fabricated with planar microfabrication technologyand reduces losses due to the dimensional features of the waveguide and the support. Theoptical losses may be reduced since the planarity of the upper surface of the waveguide maybe very well controlled, while losses on lateral side surfaces may be reduced due to the high width to height ratio.
    [7] [0007] the support structure at the point of support of the waveguide may be less than half of the The width to height ratio may be more than 10 or more than 20. The width of width of the waveguide, less than 1/4 of the width of the waveguide or less than 1/10 of thewidth of the waveguide. Preferably the width of the support structure at the point of support ofthe waveguide is small to reduce optical losses through the support structure. The supportstructure may have a shape with a cross sectional width which decreases from the support to the waveguide, to make the support structure more mechanically rigid.
    [8] [0008] waveguide, and wherein the width of the support varies correspondingly along the length The width of the waveguide may be varied along the length direction of the direction of the waveguide.
    [9] [0009] also makes it possible to reduce the width of the support to the point when the support is Thus a simple way of varying the dimensions of the support is provided, which removed. Thus the support may be tailored along the length of the waveguide. A gradualvariation of the width of the support structure further has the advantage of reducing reflections of the electromagnetic wave propagating in the waveguide.
    [10] [0010] direction, wherein the width of the waveguide and thus the support is decreased such that The waveguide may be supported along at least a first portion of the length the waveguide is free hanging along at least a second portion of the length direction.
    [11] [0011] and any optical losses through the support may be reduced.
    [12] [0012] the waveguide such that to deflect the waveguide.
    [13] [0013] modulated by the deflection of the waveguide. The force may be provided by applying an Thus the electromagnetical wave propagating through the waveguide may be electrical potential between the substrate and the waveguide, at least at the free hangingsecond portion of the waveguide, such that to deflect the waveguide with respect to thesubstrate. Alternatively the force may be applied by thermal actuation, piezoelectric actuation etc.
    [14] [0014] waveguide, the at least one gap being less than the wavelength of the electromagnetic wave, The waveguide may comprise at least one gap along the length direction of the preferably less than 1/5 or less than 1/10 of the wavelength of the electromagnetic wave.
    [15] [0015] electrical hinder. This may be used to obstruct thermal or electrical disturbances to Thus the waveguide may be provided with a low optical loss thermal and/or propagate from one part of the waveguide to another part of the waveguide while providing a low optical loss.
    [16] [0016] couple an electromagnetic wave from the source into the waveguide, the source having an The device may comprise a thermal source of radiation positioned such that to extension being less than 1/5 of the wavelength of the electromagnetic wave.
    [17] [0017] positioned within the evanescent field of the waveguide, creating a strong overlap between Such a small source of radiation has the advantage of being able to be the near-field of the emitter and the waveguide mode. lt also acts as a partially polarizedsource of radiation due to the small extension relative to the wavelength. This may be used to excite a preferred mode of excitation in the waveguide.
    [18] [0018] electromagnetic wave from the waveguide, in a cross-section of the waveguide, such that to The thermal source of radiation may be positioned within one wavelength of the excite a preferred mode of propagation in the waveguide, preferably within 1/5 of the wavelength of the electromagnetic wave from the waveguide.
    [19] [0019] thermal source of radiation is spaced apart from the waveguide.
    [20] [0020] waveguide is that the waveguide will act to conduct heat from the radiation source. Thereby The advantage of having the thermal source of radiation abutting the the frequency of excitation of the thermal source of excitation may be high. On the otherhand having the thermal source of radiation spaced apart from the waveguide may reduce the thermal mass and thus increase energy efficiency.
    [21] [0021] such that to couple an electromagnetic wave from the waveguide to the detecting element.
    [22] [0022] coupled from the waveguide to the detecting element to detect any absorption by Thus the electromagnetic wave propagated through the waveguide may be components of gas surrounding the waveguide.
    [23] [0023] electromagnetic wave from the waveguide, in a cross-section of the waveguide, such that to The detecting element may be positioned within one wavelength of the detect a preferred mode of excitation in the waveguide, preferably within 1/10 of the wavelength of the electromagnetic wave from the waveguide.
    [24] [0024] the detecting element may be improved.
    [25] [0025] frequency range of detection. Alternatively the detecting element may be spaced apart from The detecting element may be abutting the waveguide, thus increasing the the waveguide, thus reducing the thermal mass of the element.
    [26] [0026] is periodic in the length direction of the waveguide.
    [27] [0027] electromagnetic wave in a desired direction. The grating may be used to direct Thus the structure may act as a grating to direct the propagating electromagnetic Waves into a direction of the waveguide, e.g. when coupling electromagneticenergy from a thermal source of excitation into the waveguide. The grating may be used todirect electromagnetic Waves out from the waveguide, e.g. When coupling electromagnetic energy from the waveguide to a detecting element.
    [28] [0028] openings in the waveguide, variations in dimensions of the waveguide, material variations of The periodic structure may comprise diffractive elements, such as recesses or the waveguide, or structures deposited onto the waveguide.
    [29] [0029] comprised in the periodic structure. The detecting element may have an extension being less The thermal source of radiation and/or the bolometric detecting element may be than 1/5 of the wavelength of the electromagnetic wave. Thus the detecting element may be incorporated in the periodic structure.
    [30] [0030] thermal source of radiation and/or bolometric detecting element and the waveguide.
    [31] [0031]index and low optical losses in the wavelength range of 0.4-10 um, or even less at 1.2-7 um.
    [32] [0032]be of a material of a second composition. The index of refraction in the first material may be The waveguide may be of a material of a first composition and the support may higher than the index of refraction in the second material, at the wavelength of theelectromagnetic wave. The material of the first composition may be e.g. single crystalline silicon and the material of the second composition may be silicon dioxide.
    [33] [0033] Thus optical losses between the waveguide and the support may be reduced.
    [34] [0034]comprising a silicon substrate, a silicon dioxide layer and a silicon device layer, wherein the The substrate, the support and the waveguide may be formed from a SOI wafer silicon substrate of the SOI wafer forms the substrate of the device, the silicon dioxide layerof the SOI wafer forms the support of the device and the silicon device layer of the SOI wafer forms the waveguide of the device.
    [35] [0035] The waveguide and the support may form a T-shaped cross-sectional structure.
    [36] [0036] the waveguide and the support.
    [37] [0037]preferably within the range of 1.2-7 um.
    [38] [0038]components in the material surrounding the waveguide. The material surrounding the Thus the electromagnetic wave may be used to detect one or more waveguide may be e.g. a gas or a liquid.
    [39] [0039]as disclosed herein for detecting at least one component in gas in contact with the The invention further relates to a gas sensor device comprising a sensor device waveguide. The at least one component in gas comprises carbon monoxide, carbon dioxide,dinitrogen oxide, water vapor, hydrocarbons, ammonia, chlorofluorocarbons and/or CFS:s.The sensor device may alternatively be a liquid sensor device comprising a sensor device as disclosed herein for detecting at least one component in liquid in contact with the waveguide.
    [40] [0040] comprising; The invention further relates to a method of detecting a component in gas providing a sensor device according to any one of the preceding claims, providing the gas in contact with the waveguide, transmitting an electromagnetic wave into a first portion of the waveguide, allowing the electromagnetic wave interact with the gas in a region of an evanescent wave ofthe electromagnetic wave around the waveguide, detecting the electromagnetic wave at a second portion of the waveguide, and detecting a component in the gas based on the detected electromagnetic wave.
    [41] [0041] and/or low gas flow.
    [42] [0042] component in liquid in contact with the waveguide.
    [43] [0043] disclosed herein comprising; The invention further relates to a method of fabricating a sensor device as providing a wafer,fabricating the waveguide in the wafer, and fabricating the support structure in the wafer.
    [44] [0044] batch fabricated in the wafer. Thus the fabrication cost may be reduced by fabricating a By using a planar wafer of material the sensor device may be miniaturized and wafer with several devices at the same time.
    [45] [0045] providing a wafer comprising a substrate layer, an intermediate layer and a device layer, The method may comprise; fabricating the waveguide in the device layer, andfabricating the support structure in the intermediate layer, wherein the substrate layer forms the substrate of the device.
    [46] [0046] components of the device (i.e. waveguide, support structure and substrate). The different Thereby the different layers provide for simple fabrication of the different layers may be optimized for the purpose of fabricating and/or operating the sensor device,e.g. the material of the device layer may be selected for having suitable optical properties,the material in the intermediate layer may be selected for having optical properties whichreduces optical losses through the support. The materials in the device and intermediatelayers may be selected to have materials properties with suitable fabrication selectivity, e.g. suitable etch selectivity if the device is fabricated by wet or dry etching.
    [47] [0047] support structure is formed in the intermediate layer by under etching the waveguide.
    [48] [0048] technology suitable for batch processing. The waveguide may be protected from the under Thus the sensor device may be fabricated by relatively simple fabrication etching by etch selectivity of materials, by depositing protective layers etcetera.
    [49] [0049] layer and a silicon device layer, wherein the silicon substrate of the SOI wafer corresponds to The wafer may be a SOI wafer comprising a silicon substrate, a silicon dioxide the substrate layer, the silicon dioxide layer of the SOI wafer corresponds to the intermediate layer and the silicon device layer of the SOI wafer corresponds to the device layer.
    [50] [0050] sensor devices as disclosed herein. The silicon device layer has suitable optical properties in Thus the materials of the wafer is suitable for batch fabrication and operation of the infrared region, the intermediate silicon dioxide layer has suitable optical properties toreduce optical losses, and the materials provide for an etch selectivity, e.g. by etching the silicon dioxide by buffered hydrofluoric acid (BH F), where the etch selectivity is very high.
    [51] [0051] structure is etched after fabricating the waveguide. The waveguide may be protected from The waveguide may be protected from etching, and wherein the support etching by an etch stop material or by doping.BRIEF DESCRIPTION OF DRAWINGS Various embodiments of the invention will now be described with reference to the appended drawings, where: Fig. 1 shows a cross-sectional view of a waveguide supported by a substrate.Fig. 2 shows a cross-sectional view of a waveguide free-hanging over a substrate.Fig. 3 shows a top view showing a portion of a waveguide having supported and free- hanging sections.
    [52] [0052] electromagnetic wave having a wavelength k. The wavelength of the electromagnetic wave The invention relates to a sensor device comprising a waveguide for guiding an is within the range of 0.4-10 um, preferably within the range of 1.2-7 um. ln Fig. 1 a cross-section of a portion of a waveguide 2 of the sensor device 1 according to one embodiment isshown. The device comprises a substrate 3 forming a support for the sensor device. Thesubstrate is in the form of a planar wafer of material and defines a substrate plane 4. Thewaveguide extends in a length direction in a waveguide plane 4' parallel to the substrate plane 4, i.e. perpendicular to the cross-sectional view of Fig. 1.
    [53] [0053] perpendicular to the length direction, and a height h out of the waveguide plane in a direction The waveguide has a width W in the waveguide plane in a direction perpendicular to the length direction. An important feature of the waveguide is that width toheight ratio W/h is more than 5. Due to these dimensional features the waveguide may befabricated with planar fabrication technologies from a wafer of material, such as silicon. Themajor surfaces of the waveguide, i.e. extending over the width of the waveguide, may thusbe made very smooth. The minor surfaces of the waveguide, i.e. extending over the height ofthe waveguide, have less impact of the optical performance of the waveguide due to thedimensional features the waveguide. These minor surfaces are more irregular than the major surfaces due to manufacturing issues.
    [54] [0054] extending from the substrate to the waveguide, along the length direction of the waveguide.
    [55] [0055] electromagnetic wave which the waveguide is designed to guide. Thus a waveguide is The height h of the waveguide is less than the wavelength k of the provided which may be used to guide an electromagnetic wave, having a large portion of the energy propagating as an evanescent wave, with low levels of optical losses in the waveguide.
    [56] [0056] waveguide. This is illustrated in Fig. 2, where the waveguide is shown from above. The The width of the waveguide may be varied along the length direction of the cross-section shown in Fig. 1 corresponds to the plane A---A, having a width W of thewaveguide. By using microfabrication technologies for fabricating the device, e.g. wet or dryetching of material, the width of the support varies correspondingly with the along the lengthdirection of the waveguide. Thus at another portion of the waveguide, at B---B, the width ofthe waveguide is w, which is less than W. The width Ws of the support structure 5 has then decreased to render the waveguide free hanging.
    [57] [0057] corresponding to the section B-B in Fig. 2 is shown. The width of the waveguide 2 is w, and ln Fig. 3 a cross-section of a portion of a waveguide 2 of the sensor device the height is h. The support structure 5 extending from the substrate 3 has been reducedwhen compared to Fig. 1 by reducing the width of the waveguide. Thus a waveguide may beprovided which is supported along at least a first portion of the length direction, and that the waveguide is free hanging along at least a second portion of the length direction.
    [58] [0058] means to apply a force to the free hanging portion of the waveguide. This is shown as a Further, in Fig. 3 it is shown that the sensor device the device may comprise means to apply a voltage potential between the substrate and the free hanging portion of thewaveguide. Such a force may be used to deflect the waveguide, which may be used to modulate the electromagnetic wave propagated through the waveguide.
    [59] [0059] along the length direction of the waveguide. The gaps are less than the wavelength of the As further shown in Fig. 2 the waveguide may comprise one or more gaps 7 electromagnetic wave, preferably less than 1/5 of the wavelength of the electromagneticwave. The gaps may be used as obstacles for heat or electricity, while still providing for propagation of the electromagnetic waves.
    [60] [0060] shown in Fig. 1. According to one embodiment the support structure has a uniform width in a The waveguide and the support forms a T-shaped cross-sectional structure, as cross section of the waveguide, forming a T-shape as shown in Fig. 4.
    [61] [0061] of a waveguide 2. The thermal source of radiation comprises a wire source extending across ln Fig. 5 an example of a thermal source of radiation 10 integrated on a section the waveguide and connected to a pair of electrical connecting pads 11 for connecting an electrical current source. The wire has a length extending across the waveguide and a width being less than 1/5 of the wavelength of the electromagnetic wave. The thermal source ofradiation is positioned on the surface of the waveguide such that to couple anelectromagnetic wave from the source into the waveguide. Thus the source is positionedwithin one wavelength of the electromagnetic wave from the waveguide such that to excite a preferred mode of propagation in the waveguide.
    [62] [0062] element positioned such that to couple an electromagnetic wave from the waveguide to the ln a similar manner the sensor device comprises a bolometric detecting detecting element. Figure 5 may be used to illustrate the bolometric detecting element, sincethe construction is similar to the thermal source of radiation. The detecting element ispositioned within one wavelength of the electromagnetic wave from the waveguide, in across-section of the waveguide, such that to detect a preferred mode of excitation in thewaveguide, preferably within 1/5 of the wavelength of the electromagnetic wave from thewaveguide. The detecting element is abutting the waveguide or is spaced apart from the waveguide.
    [63] [0063]in the length direction of the waveguide, as shown as a plurality of diffractive elements in the As shown in Fig. 6 the waveguide 2 may comprise a structure 8 being periodic form of cut-out openings 9 having a period p. Alternatively the diffractive elements maycomprise recesses or openings in the waveguide, variations in dimensions of the waveguide,material variations of the waveguide, or structures deposited onto the waveguide. Theperiodic structure 8 may include the source of radiation 10, and periodic structure mayfunction as a grating having a period may be configured to direct the electromagneticalenergy in the length direction of the waveguide. Similarly, the bolometric detecting element may be comprised in the periodic structure.
    [64] [0064] optical properties in the wavelength range of 0.4-10 um, or even better at the wavelength The material of the waveguide 2 may be single crystalline silicon, having good range of 1.2-7 um. lt is conceived that the waveguide is of a material of a first compositionand the support structure is of a material of a second composition. Preferably the index ofrefraction in the first material is higher than the index of refraction in the second material, atthe wavelength of the electromagnetic wave. The support structure may thus e.g. be ofsilicon dioxide, which due to the differences in refractive index will reduce optical losses from the waveguide to the support structure.
    [65] [0065] of the sensor device is formed from a silicon on insulator (SOI) wafer comprising a silicon According to one example the substrate 3, the support 5 and the waveguide 2 substrate, a silicon dioxide layer and a silicon device layer. The silicon substrate of the SOI 11 wafer forms the substrate of the device, the silicon dioxide layer of the SOI wafer forms thesupport of the device and the silicon device layer of the SOI wafer forms the waveguide of the device.
    [66] [0066] detecting at least one component in gas is shown. ln Fig. 7(a) a gas sensor device for ln Fig. 7 two examples of a gas sensor device comprising a sensor device for detecting one component in gas. The sensor device comprises a waveguide 2, on a supportstructure as previously discloses, formed as a double spiral and thus providing a very longwaveguide on a small area. As an alternative the waveguide may have a meander shape orother spiral shapes. The sensor device further comprises a thermal source of radiation 10 ata first portion of the waveguide and a detecting element 13 on a second portion of thewaveguide. The radiation source is driven by a current source 12 to generate anelectromagnetic wave of a specified frequency, which is coupled into the waveguide. Theelectromagnetic wave propagates along the waveguide, having a large portion of the energypropagating as an evanescent wave in the space surrounding the waveguide. ln this space,and in the region of the evanescent wave along the waveguide, any component of gashaving a peak of absorption corresponding to the wavelength of the electromagnetic wavewill absorb energy from the propagating wave. The amount of energy in the electromagneticwave at the selected frequency will be detected by the detecting element and will be a measure of the amount and/or presence of the component of gas.
    [67] [0067] of gas (gas 1, gas 2 and gas 3) is shown. The gas sensor device differs from what is shown ln Fig. 7(b) a similar gas sensor device for detecting three different components in Fig. 7(a) in that the thermal source of radiation is configured to emit electromagneticwaves of several wavelengths, corresponding to absorption peaks for more than onecomponent of gas. The presence (and amount) of any of the three components of gas (gas1, gas 2 and gas 3) in the region of the evanescent wave of the electromagnetic waves alongthe waveguide, will be detected as an absorption of energy. Each component of gas may bedetected by a dedicated detecting element 13, 13', 13”. The detecting elements may becoupled to the waveguide by wavelength selecting devices, such as gratings, to tap off a selected wavelength of the propagating electromagnetic wave.
    [68] [0068] gas is illustrated in Fig. 8. The method 800 comprises the steps of providing a sensor 801 as Having a sensor device as disclosed, a method of detecting a component in disclosed herein, providing gas in contact with the waveguide 802 and transmitting anelectromagnetic wave into the first portion of the waveguide 803. The electromagnetic wavepropagates through the waveguide, having a large portion of the electromagnetic energy propagating as an evanescent wave along the waveguide. This evanescent wave interacts 12 804 with the gas in a region around the waveguide, which absorbs energy at specificfrequencies of the electromagnetic wave. The electromagnetic wave is thereafter detected805 by the detecting element at a second portion of the waveguide. From the specific spectrum of absorption a component in the gas may be detected 806.
    [69] [0069] dinitrogen oxide, water vapor, hydrocarbons, ammonia and/or chlorofluorocarbons.
    [70] [0070] comprises the step (b) of providing a wafer comprising a substrate layer, an intermediate ln Fig. 9 a method of fabricating a sensor device (a) is disclosed. The method layer and a device layer. The wafer may be a SOI wafer comprising a silicon substrate, asilicon dioxide layer and a silicon device layer. The waveguide is fabricated in the devicelayer by lithography and dry etching with photoresist as etch mask, (c) and (d). The supportstructure is fabricated in the intermediate layer (e) by wet isotropic etching, i.e. under etchingof the waveguide. Finally the photoresist etch mask is removed (f). Depending on the widthof the waveguide, the width of the support structure may be controlled, as illustrated by theleft- and right hand side of the drawing, and the waveguide may be made free hanging atportions along the waveguide. The substrate layer of the wafer forms the substrate of thedevice. The silicon substrate of the SOI wafer corresponds to the substrate layer, the silicondioxide layer of the SOI wafer corresponds to the intermediate layer and the silicon device layer of the SOI wafer corresponds to the device layer.
    [71] [0071] fabricating the waveguide and protecting the waveguide from etching by depositing an etch Alternatively the waveguide and support structure may be fabricated by stop material. Thereafter the support structure may be etched. As a further alternative thematerial for forming the waveguide in the wafer may be doped such that to provide an etch selectivity for the etching of the waveguide and surrounding material.
    权利要求:
    Claims (1)
    [1] 1. 3 CLA|/IS _ A sensor device (1) comprising; a planar substrate (3) defining a substrate plane (4) a waveguide (2) for guiding an electromagnetic wave, the waveguide extending in alength direction in a waveguide plane (4') parallel to the substrate plane (4), thewaveguide having a width (W, W) in the waveguide plane in a direction perpendicularto the length direction, and a height (h) out of the waveguide plane in a directionperpendicular to the length direction, wherein the width (W, W) to height (h) ratio ismore than 5, wherein the height (h) of the waveguide is less than the wavelength of theelectromagnetic wave, and wherein the waveguide is supported on the substrate by a support structure (5)extending from the substrate to the waveguide, along the length direction of thewaveguide, having a width (Ws) which is smaller than the width (W, w) of the waveguide. _ The sensor device according to claim 1 wherein the width (W, w) of the waveguide is varied along the length direction of the waveguide, and wherein the width (Ws) of the support varies correspondingly along the length direction of the waveguide. _ The sensor device according to claim 2 wherein the waveguide is supported along at least a first portion of the length direction, and wherein the width of the waveguideand thus the support is decreased such that the waveguide is free hanging along at least a second portion of the length direction. _ The sensor device according to claim 3 wherein the device comprises means to apply a force to the free hanging portion of the waveguide such that to deflect the waveguide. _ The sensor device according to any one of the preceding claims wherein the waveguide comprises at least one gap (7) along the length direction of thewaveguide, the at least one gap being less than the wavelength of theelectromagnetic wave, preferably less than 1/5 of the wavelength of the electromagnetic wave. _ The sensor device according to any one of the preceding claims wherein the device comprises a thermal source of radiation (10) positioned such that to couple anelectromagnetic wave from the source into the waveguide, the source having an extension being less than 1/5 of the wavelength of the electromagnetic wave. _ The sensor device according to claim 6 wherein the thermal source of radiation is positioned within one wavelength of the electromagnetic wave from the waveguide, in 10. 11. 12. 13. 14. 15. 16. 17. 18. 14 a cross-section of the waveguide, such that to excite a preferred mode of propagationin the waveguide, preferably within 1/5 of the wavelength of the electromagnetic Wavefrom the waveguide. The sensor device according to claim 6 or 7 wherein the thermal source of radiation isabutting the waveguide or wherein the thermal source of radiation is spaced apartfrom the waveguide. The sensor device according to any one of the preceding claims wherein the devicecomprises a detecting element (13, 13', 13") positioned such that to couple anelectromagnetic Wave from the waveguide to the detecting element. The sensor device according to claim 9 wherein the detecting element is positionedwithin one wavelength of the electromagnetic wave from the waveguide, in a cross-section of the waveguide, such that to detect a preferred mode of excitation in thewaveguide, preferably within 1/10 of the wavelength of the electromagnetic wavefrom the waveguide. The sensor device according to claim 9 or 10 wherein the detecting element isabutting the waveguide or wherein the detecting element is spaced apart from thewaveguide. The sensor device according to any one of the preceding claims wherein thewaveguide comprises a periodic structure (8), preferably a structure which is periodicin the length direction of the waveguide. The sensor device according to claim 12 wherein the periodic structure comprisesdiffractive elements (9), such as recesses or openings in the waveguide, variations indimensions of the waveguide, material variations of the waveguide, or structuresdeposited onto the waveguide. The sensor device according to claim 12 or 13, and any one of claims 6-8 and/or anyone of claims 7-11, wherein the thermal source of radiation (10) and/or the detectingelement (13, 13', 13") is comprised in the periodic structure. The sensor device according to any one of the preceding claims wherein thewaveguide (2) is of a material of a first composition and the support (5) is of amaterial of a second composition. The sensor device according to claim 15 wherein the detecting element (13, 13', 13")has an extension being less than 1/5 of the wavelength of the electromagnetic wave.The sensor device according to claim 15 and wherein the index of refraction in thefirst material is higher than the index of refraction in the second material, at thewavelength of the electromagnetic wave. The sensor device according to any one of the preceding claims wherein the substrate (3), the support (5) and the waveguide (2) is formed from a SOI wafer 19. 20. 21. 22. 23. 24. 25. 26. comprising a silicon substrate, a silicon dioxide layer and a silicon device layer,wherein the silicon substrate of the SOI wafer forms the substrate of the device, thesilicon dioxide layer of the SOI wafer forms the support of the device and the silicondevice layer of the SOI wafer forms the waveguide of the device. The sensor device according to any one of the preceding claims wherein thewaveguide (2) and the support structure (5) forms a T-shaped cross-sectionalstructure. The sensor device according to any one of the preceding claims wherein thewavelength of the electromagnetic wave is within the range of 0.4-10 um, preferablywithin the range of 1.2-7 um. A gas sensor device comprising a sensor device (1) according to any one of thepreceding claims for detecting at least one component in a fluid, such as a gas.The gas sensor device according to claim 21 wherein the at least one component ingas comprises carbon monoxide, carbon dioxide, dinitrogen oxide, water vapor,hydrocarbons, ammonia, chlorofluorocarbons and/or CFS:s. A method (800) of detecting a component in a fluid comprising; providing (801) a sensor device according to any one of the preceding claims,providing (802) the fluid in contact with the waveguide, transmitting (803) an electromagnetic wave into a first portion of the waveguide,allowing the electromagnetic wave interact (804) with the fluid in a region of anevanescent wave of the electromagnetic wave around the waveguide, detecting (805) the electromagnetic wave at a second portion of the waveguide, and detecting (806) a component in the gas based on the detected electromagnetic wave. A method of fabricating a sensor device according to any one of claims 1-21comprising; providing a wafer, fabricating the waveguide in the wafer, and fabricating the support structure in the wafer. The method according to claim 24 comprising; providing a wafer comprising a substrate layer, an intermediate layer and a devicelayen fabricating the waveguide in the device layer, and fabricating the support structure in the intermediate layer, wherein the substrate layer forms the substrate of the device. The method according to claim 25 wherein the waveguide is formed in the devicelayer by etching and wherein the support structure is formed in the intermediate layer by under etching the waveguide. 27. 28. 29. 30. 16 The method according to claim 25 or 26 wherein the wafer is a SOI wafer comprisinga silicon substrate, a silicon dioxide layer and a silicon device layer, wherein thesilicon substrate of the SOI wafer corresponds to the substrate layer, the silicondioxide layer of the SOI wafer corresponds to the intermediate layer and the silicondevice layer of the SOI wafer corresponds to the device layer. The method according to claim 24 wherein the waveguide is protected from etching,and wherein the support structure is etched after fabricating the waveguide. The method according to claim 28 wherein the waveguide is protected from etchingby an etch stop material. The method according to claim 28 wherein the waveguide is protected from etching by doping.
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    US20190154570A1|2019-05-23|
    KR20180020152A|2018-02-27|
    SE540878C2|2018-12-11|
    EP3314238A1|2018-05-02|
    US10598590B2|2020-03-24|
    JP2021001900A|2021-01-07|
    CN107810405B|2020-09-08|
    JP6903018B2|2021-07-14|
    JP2018521322A|2018-08-02|
    WO2017003353A1|2017-01-05|
    US10209180B2|2019-02-19|
    CA2990947A1|2017-01-05|
    CN107810405A|2018-03-16|
    US20180164208A1|2018-06-14|
    CN111896494A|2020-11-06|
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